Publication: Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material
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Date
2020
Authors
Hasan A.K.M.
Raifuku I.
Amin N.
Ishikawa Y.
Sarkar D.K.
Sobayel K.
Karim M.R.
Ul-Hamid A.
Abdullah H.
Shahiduzzaman M.
Journal Title
Journal ISSN
Volume Title
Publisher
OSA - The Optical Society
Abstract
The electron-beam physical vapor deposition (EBPVD) technique was selected for nickel oxide (NiOx) film deposition at room temperatures. NiOx film (18 nm thick) was deposited as a hole transporting material (HTM) for inverted perovskite solar cells (PSCs) onto a fluorine-doped tin oxide (FTO)-coated glass substrate at a chamber vacuum pressure of 4.6104 Pa. PSCs were fabricated as a glass/FTO/NiOx(HTM)/CH3NH3PbI3/PC61BM/BCP/Ag structure with as-deposited and annealed (500 �C for 30 min) NiOx films. Under 100 mW cm2 illumination, as-deposited and annealed NiOx as HTM in PSCs (0.16 cm2) showed a high-power conversion efficiency (PCE) of 13.20% and 13.24%, respectively. The as-deposited and annealed PSCs retained 72.2% and 76.96% of their initial efficiency in ambient conditions, correspondingly. This study highlights the possibility of achieving highly crystalline and finely disseminated NiOx films by EBPVD for fabricating efficient inverted PSCs. � 2020 Optical Society of America.
Description
Annealing; Efficiency; Glass; Nanocomposites; Nanocrystalline materials; Nickel oxide; Perovskite; Photoelectrochemical cells; Photovoltaic cells; Physical vapor deposition; Substrates; Temperature; Tin oxides; Ambient conditions; Coated glass substrates; Electron beam-physical vapor deposition; Fluorine doped tin oxide; High power conversion; Hole-transporting materials; Initial efficiency; Low temperatures; Perovskite solar cells