Publication: Effects of anodisation parameters on thin film properties: a review
Date
2017
Authors
Wong Y.H.
Affendy M.G.
Lau S.K.
Teh P.C.
Lee H.J.
Tan C.Y.
Ramesh S.
Journal Title
Journal ISSN
Volume Title
Publisher
Taylor and Francis Ltd.
Abstract
Electrochemical anodisation is a well-received method in the complementary metal-oxide-semiconductor field as it is advantageous; best performed at room temperature which translates into being more affordable and a simple alternative to form nano-structured oxide films for different metals. The quintessential parameters involved allow numerous formations of metal oxide films according to desired morphology and thickness. Therefore, this paper aims to review the effects of anodising parameters such as applied voltage, concentration, temperature, time, current density and post-anodisation annealing among them. � 2016 Institute of Materials, Minerals and Mining.
Description
CMOS integrated circuits; Metallic compounds; Metals; MOS devices; Oxide semiconductors; Temperature; Thin films; Anodisation; Anodising; Applied voltages; Complementary metal oxide semiconductors; Metal oxide film; Nano-structured; Thickness; Thin-film properties; Oxide films