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Effect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphite

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dc.citedby22
dc.contributor.authorRahman M.Y.A.en_US
dc.contributor.authorSalleh M.M.en_US
dc.contributor.authorTalib I.A.en_US
dc.contributor.authorYahaya M.en_US
dc.contributor.authorid55347217400en_US
dc.contributor.authorid55613229960en_US
dc.contributor.authorid7801465202en_US
dc.contributor.authorid7003350598en_US
dc.date.accessioned2023-12-28T08:58:18Z
dc.date.available2023-12-28T08:58:18Z
dc.date.issued2005
dc.description.abstractThis paper reports the effect of surface topography of titanium dioxide films on short-circuit current density of photoelectrochemical solar cell of ITO/TiO2/PVC-LiCLO4/graphite. The films were deposited onto ITO-covered glass substrate by screen-printing technique. The films were tempered at 300�C, 350�C, 400�C, 450�C and 500�C for 30 min to burn out the organic parts and to achieve the films with porous structure. The surface roughness of the films were studied using scanning electron microscope (SEM). Current-voltage relationship of the devices were characterized in dark at room temperature and under illumination of 100 mW cm-2 light from tungsten halogen lamp at 50�C. The device utilising the TiO2 film annealed at 400�C produces the highest short-circuit current density and open-circuit voltage as it posses the smoothest surface topography with the electrolyte. The short-circuit current density and open-circuit voltage of the devices increase with the decreasing grain size of the TiO2 films. The short-circuit current density and open-circuit voltage are 0.6 ?A/cm2 and 109 mV respectively. � 2004 Elsevier B.V. All rights reserved.en_US
dc.description.natureFinalen_US
dc.identifier.doi10.1016/j.cap.2004.08.003
dc.identifier.epage602
dc.identifier.issue6
dc.identifier.scopus2-s2.0-22144450708
dc.identifier.spage599
dc.identifier.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-22144450708&doi=10.1016%2fj.cap.2004.08.003&partnerID=40&md5=ce8806f55a64db60f52545b02a28bdd6
dc.identifier.urihttps://irepository.uniten.edu.my/handle/123456789/29929
dc.identifier.volume5
dc.pagecount3
dc.sourceScopus
dc.sourcetitleCurrent Applied Physics
dc.subjectPhotoelectrochemical cell
dc.subjectScreen-printing technique
dc.subjectSurface topography
dc.subjectTitanium dioxide
dc.subjectCurrent density
dc.subjectCurrent voltage characteristics
dc.subjectFilms
dc.subjectPhotoelectrochemical cells
dc.subjectPorous materials
dc.subjectScanning electron microscopy
dc.subjectScreen printing
dc.subjectShort circuit currents
dc.subjectSolar cells
dc.subjectSubstrates
dc.subjectSurface roughness
dc.subjectSurface topography
dc.subjectOpen circuit voltage
dc.subjectShort circuit current density
dc.subjectTitanium dioxide films
dc.subjectTitanium dioxide
dc.titleEffect of surface roughness of TiO2 films on short-circuit current density of photoelectrochemical cell of ITO/TiO2/ PVC-LiClO4/graphiteen_US
dc.typeArticleen_US
dspace.entity.typePublication
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