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Removal of antibiotic sulfamethoxazole in water using rapid growing ZnO nanorod

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dc.citedby9
dc.contributor.authorAhmadipour M.en_US
dc.contributor.authorRezaei Ardani M.en_US
dc.contributor.authorchrouda A.en_US
dc.contributor.authorPang A.L.en_US
dc.contributor.authorMohd Razip Wee M.F.en_US
dc.contributor.authorSatgunam M.en_US
dc.contributor.authorid55533484700en_US
dc.contributor.authorid57221374739en_US
dc.contributor.authorid55769666100en_US
dc.contributor.authorid55937339700en_US
dc.contributor.authorid58956706300en_US
dc.contributor.authorid48561725600en_US
dc.date.accessioned2025-03-03T07:42:25Z
dc.date.available2025-03-03T07:42:25Z
dc.date.issued2024
dc.description.abstractThe primary objective of this research is to synthesize ZnO vertical nanorods on a conductive substrate through a novel approach. In this method, ZnO nanorods are grown on kanthal wires using the direct heating (DH) technique. The study investigated the application of ZnO nanorods in photodegradation, specifically in removing Sulfamethoxazole (SMX). Through comprehensive analysis techniques, including XRD, FESEM, and TEM, the successful growth of ZnO nanorods on kanthal wires is confirmed. Their photocatalytic activity in SMX degradation is evaluated at varying concentrations (3 ppm, 5 ppm, 10 ppm) under UV light. Notably, the ZnO sample produced under 80 W power and 120 min emerges as the most promising, exhibiting a high surface area of 36 m2g-1, larger length of 755 nm, and lower diameter of 12 nm, as well as superior SMX photodegradation percentages of 87.64 % (3 ppm), 77.86 % (5 ppm), and 51.84 % (10 ppm) after 60 min. These findings highlight the potential of synthesizing ZnO nanorods via DH technique as an efficient and sustainable solution for removing pharmaceutical contamination in water sources. ? 2024 Elsevier Ltd and Techna Group S.r.l.en_US
dc.description.natureFinalen_US
dc.identifier.doi10.1016/j.ceramint.2024.04.405
dc.identifier.epage27653
dc.identifier.issue15
dc.identifier.scopus2-s2.0-85192059680
dc.identifier.spage27645
dc.identifier.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85192059680&doi=10.1016%2fj.ceramint.2024.04.405&partnerID=40&md5=0ca3b43e5ec9cf6a6104f0f702ee3794
dc.identifier.urihttps://irepository.uniten.edu.my/handle/123456789/36437
dc.identifier.volume50
dc.pagecount8
dc.publisherElsevier Ltden_US
dc.sourceScopus
dc.sourcetitleCeramics International
dc.subjectII-VI semiconductors
dc.subjectNanorods
dc.subjectPhotocatalytic activity
dc.subjectWater treatment
dc.subjectAnalysis techniques
dc.subjectAntibiotic sulfamethoxazole
dc.subjectComprehensive analysis
dc.subjectConductive substrates
dc.subjectDirect heating
dc.subjectKanthal
dc.subjectPhoto degradation
dc.subjectPrimary objective
dc.subjectSulfamethoxazole
dc.subjectZnO nanorod
dc.subjectZinc oxide
dc.titleRemoval of antibiotic sulfamethoxazole in water using rapid growing ZnO nanoroden_US
dc.typeArticleen_US
dspace.entity.typePublication
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