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Enhancement of the work function of indium tin oxide by surface modification using caesium fluoride

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dc.citedby14
dc.contributor.authorWhitcher T.J.en_US
dc.contributor.authorYeoh K.H.en_US
dc.contributor.authorNg Y.B.C.en_US
dc.contributor.authorTalik N.A.en_US
dc.contributor.authorChua C.L.en_US
dc.contributor.authorWoon K.L.en_US
dc.contributor.authorChanlek N.en_US
dc.contributor.authorNakajima H.en_US
dc.contributor.authorSaisopa T.en_US
dc.contributor.authorSongsiriritthigul P.en_US
dc.contributor.authorOswald S.en_US
dc.contributor.authorYap B.K.en_US
dc.contributor.authorid26641611700en_US
dc.contributor.authorid55681242500en_US
dc.contributor.authorid57215746121en_US
dc.contributor.authorid55576358000en_US
dc.contributor.authorid55681416600en_US
dc.contributor.authorid12041961200en_US
dc.contributor.authorid24775167600en_US
dc.contributor.authorid36562269300en_US
dc.contributor.authorid55931748600en_US
dc.contributor.authorid6603434551en_US
dc.contributor.authorid55245855200en_US
dc.contributor.authorid26649255900en_US
dc.date.accessioned2023-12-29T07:43:47Z
dc.date.available2023-12-29T07:43:47Z
dc.date.issued2013
dc.description.abstractThe work function of indium tin oxide (ITO) was modified using caesium fluoride (CsF). Various concentrations of CsF was spin-coated on top of ITO and baked while the residual CsF was washed away with DI water. The work function of all the ITO samples was measured using ultraviolet photoelectron spectroscopy and it was found that the work function of ITO reaches as high as 5.75 eV. The work function rapidly increases with small concentrations of CsF solution and then decreases for higher concentrations. Using atomic force microscopy and x-ray photoelectron spectroscopy, the cause was determined to be the change in surface roughness and the oxygen concentration, with the former having a much greater influence on the work function than the latter. The current density of ITO/poly(vinylcarbazole)/Al hole-only devices using the modified ITO increases by more than seven orders of magnitude compared with the control device. � 2013 IOP Publishing Ltd.en_US
dc.description.natureFinalen_US
dc.identifier.ArtNo475102
dc.identifier.doi10.1088/0022-3727/46/47/475102
dc.identifier.issue47
dc.identifier.scopus2-s2.0-84887829986
dc.identifier.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-84887829986&doi=10.1088%2f0022-3727%2f46%2f47%2f475102&partnerID=40&md5=0d34e58e5b122a1c054ec54ca32147de
dc.identifier.urihttps://irepository.uniten.edu.my/handle/123456789/29966
dc.identifier.volume46
dc.sourceScopus
dc.sourcetitleJournal of Physics D: Applied Physics
dc.subjectAtomic force microscopy
dc.subjectCesium
dc.subjectFluorine compounds
dc.subjectPhotoelectrons
dc.subjectSurface roughness
dc.subjectTin
dc.subjectUltraviolet photoelectron spectroscopy
dc.subjectX ray photoelectron spectroscopy
dc.subjectControl device
dc.subjectHole-only device
dc.subjectIndium tin oxide
dc.subjectOrders of magnitude
dc.subjectOxygen concentrations
dc.subjectSmall concentration
dc.subjectVinylcarbazole
dc.subjectWork function
dc.titleEnhancement of the work function of indium tin oxide by surface modification using caesium fluorideen_US
dc.typeArticleen_US
dspace.entity.typePublication
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