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Seed-mediated liquid phase deposition method for TiO2 nanostructure growth on ITO substrate: Effect of surfactant

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dc.citedby10
dc.contributor.authorRoza L.en_US
dc.contributor.authorUmar A.A.en_US
dc.contributor.authorRahman M.Y.A.en_US
dc.contributor.authorSalleh M.M.en_US
dc.contributor.authorid54403859400en_US
dc.contributor.authorid9332520900en_US
dc.contributor.authorid55347217400en_US
dc.contributor.authorid55613229960en_US
dc.date.accessioned2023-12-29T07:47:35Z
dc.date.available2023-12-29T07:47:35Z
dc.date.issued2012
dc.description.abstractThis paper reports the study on the effect of the surfactants, cetyltrimethylammonium bromide (CTAB) and hexamethylenetetramine (HMT) on the growth of TiO2 nanostructures on ITO surface. TiO2 nanostructures were prepared using a seed-mediated liquid phase deposition (LPD) method. LPD is an electrolysis deposition of metal oxide via hydrolysis of metal-fluoro complex in the presence of boric acid at ambient temperature. In typical case, this method allows the formation of metal oxide film on the substrate surface. Since the properties strongly depend on shape at this length scale, the morphology control growth of TiO2 nanostructures is highly demanded in order to produce desired properties in application. In this work we demonstrate the growth of wire like structure of TiO2 (instead of film) on ITO surface via a seed-mediated liquid phase deposition in the present of surfactant. In typical result, TiO2 with diameter ca. 40 nm at the bottom of nanowire to ca. 10 nm at the nanowire tip can be successfully grown on the surface. The effect of surfactant and their concentration on the growth characteristics of TiO2 nanostructure will be discussed.en_US
dc.description.natureFinalen_US
dc.identifier.doi10.4028/www.scientific.net/AMR.364.393
dc.identifier.epage397
dc.identifier.scopus2-s2.0-81855198058
dc.identifier.spage393
dc.identifier.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-81855198058&doi=10.4028%2fwww.scientific.net%2fAMR.364.393&partnerID=40&md5=f86680ad6291ece49f4003044ddb1a11
dc.identifier.urihttps://irepository.uniten.edu.my/handle/123456789/30415
dc.identifier.volume364
dc.pagecount4
dc.sourceScopus
dc.sourcetitleAdvanced Materials Research
dc.subjectLiquid phase deposition
dc.subjectSurfactant
dc.subjectTiO<sub>2</sub> nanostructure
dc.subjectAmmonium compounds
dc.subjectBromine compounds
dc.subjectFilm growth
dc.subjectInorganic acids
dc.subjectMetallic compounds
dc.subjectNanostructured materials
dc.subjectNanowires
dc.subjectOxide films
dc.subjectSurface active agents
dc.subjectTitanium dioxide
dc.subjectBoric acids
dc.subjectCetyltrimethylammonium bromide
dc.subjectGrowth characteristic
dc.subjectLength scale
dc.subjectLiquid phase deposition method
dc.subjectLiquid-phase deposition
dc.subjectMetal oxide film
dc.subjectMetal oxides
dc.subjectMetal-fluoro complex
dc.subjectMorphology control
dc.subjectNanostructure growth
dc.subjectSeed mediated
dc.subjectSubstrate surface
dc.subjectSurfactant
dc.subjectTiO
dc.subjectWirelike structures
dc.subjectLiquids
dc.titleSeed-mediated liquid phase deposition method for TiO2 nanostructure growth on ITO substrate: Effect of surfactanten_US
dc.typeConference paperen_US
dspace.entity.typePublication
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