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Development of the super-heterodyne microwave interferometer and langmuir probe system for plasma diagnostics

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dc.contributor.affiliationen_US
dc.contributor.authorYee Yue Feien_US
dc.date.accessioned2023-05-03T15:16:35Z
dc.date.available2023-05-03T15:16:35Z
dc.date.issued2006
dc.description.abstractLow temperature plasma or process plasma is widely used in various types of material processing such as surface modification, etching and coating.en_US
dc.description.endpage92en_US
dc.description.startpage1en_US
dc.identifier.urihttps://irepository.uniten.edu.my/handle/123456789/20728
dc.language.isoenen_US
dc.titleDevelopment of the super-heterodyne microwave interferometer and langmuir probe system for plasma diagnosticsen_US
dc.typeResource Types::text::Final Year Projecten_US
dspace.entity.typePublication
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